Dr. Theodore Cacouris
Product Marketing Director at Cymer LLC
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | March 21, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Semiconductors, Carbon, Light sources, Deep ultraviolet, Metals, Nitrogen, Helium, Neon, Semiconducting wafers, New and emerging technologies

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Light sources, Logic, Optical lithography, Deep ultraviolet, 3D metrology, Photomasks, Immersion lithography

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Light sources, Optical lithography, Data modeling, Deep ultraviolet, Scanners, Process control, Photomasks, Excimer lasers, Beam shaping, Immersion lithography, Optical proximity correction, Critical dimension metrology

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Semiconductors, Lithography, Light sources, Deep ultraviolet, Excimer lasers, Excimers, Neon, Chemical elements, Molybdenum, Fluorine, Halogens

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Light sources, Scanners, Error analysis, Ions, Gases, Manufacturing, Laser scanners, Excimer lasers, 3D scanning, Neodymium, Molybdenum, Data analysis

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Semiconductors, Lithography, Light sources, Optical lithography, Deep ultraviolet, Manufacturing, Control systems, Helium, Critical dimension metrology, Molybdenum

Showing 5 of 13 publications
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