Microlithographic objectives have been developed for deep ultraviolet and vacuum ultraviolet wavelengths used for printing and inspection applications related to microlithographic processes. Refractive and catadioptric design solutions using fused silica, calcium fluoride and other crystals are discussed. Several reflective and catadioptric design forms having central obscurations will be compared to refractive forms. Design complexity, performance and limitations are compared.
This paper will discuss the usefulness of a lens manufacturing database to the optical designer. Manufacturing statistics can readily be computed to assist with tolerancing studies. This tool can easily report manufactured element parameters to assist with manufacturing compensation models prior to lens assembly.