Computer engineer with a MSc and PhD in microelectronics, with more than 10 years of combining experiences in the development of EDA and image/signal processing software. Experience in modeling and statistics. Knowledge on IC design flow, especially on the back-end (standard-cell libraries creation and characterization). Knowledge on Lithography, specially Mask-Dataprep and e-beam mask writing and direct writing. Specialities: EDA algorithms. Modeling, Image Processing, object modeling and recognition, artificial intelligence. Programming in C++, Perl, Python, C, Java and Matlab.
Determining the validity domain of roughness measurements as a function of CD-SEM acquisition conditions
Effects on electron scattering and resist characteristics using assisting underlayers for e-beam direct write lithography
Advanced module for model parameter extraction using global optimization and sensitivity analysis for electron beam proximity effect correction
Improved electron backscattering representation using a new class of distribution: application to EUV masks