Dr. Thiago Figueiro
VP Business Development at ASELTA Nanographics
SPIE Involvement:
Author
Profile Summary

Computer engineer with a MSc and PhD in microelectronics, with more than 10 years of combining experiences in the development of EDA and image/signal processing software. Experience in modeling and statistics.
Knowledge on IC design flow, especially on the back-end (standard-cell libraries creation and characterization). Knowledge on Lithography, specially Mask-Dataprep and e-beam mask writing and direct writing.

Specialities: EDA algorithms. Modeling, Image Processing, object modeling and recognition, artificial intelligence. Programming in C++, Perl, Python, C, Java and Matlab.
Publications (14)

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Calibration, Photomasks, Metals, Model-based design, Manufacturing, Etching, Metrology, Critical dimension metrology, Scanning electron microscopy, Electron beam lithography

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Photomasks, Lithography, Model-based design, Optical lithography, Photonics, Algorithm development, Semiconductors, Silicon photonics, Databases, Optical proximity correction

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Point spread functions, Critical dimension metrology, Algorithm development, Scattering, Calibration, Cadmium sulfide, Computer simulations, Semiconducting wafers, Photovoltaics, Electron beams

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Photomasks, Data modeling, Calibration, Process modeling, Metrology, Critical dimension metrology, Mask making, Data processing, Photoresist processing, Optical proximity correction

Proceedings Article | 29 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Tolerancing, Lithography, Manufacturing, Vestigial sideband modulation, Photomasks, Data processing, Photoresist processing, Electron beam lithography, Printing, Photonic crystals

Showing 5 of 14 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top