Thomas Cardinali
Research & Development Engineer at HP Inc.
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Optical lithography, Switching, Electrodes, Metals, Ultraviolet radiation, CMOS technology, Nanoimprint lithography, Reactive ion etching, Hybrid circuits, Nanowires

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Oxides, Lithography, Electron beam lithography, Polymers, Scanning electron microscopy, Photoresist materials, Photomasks, Mask making, Semiconducting wafers, Chemically amplified resists

Proceedings Article | 1 August 2002
Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX
KEYWORDS: Packaging, Lithography, Opacity, Etching, Resistance, Photomasks, Mask making, Critical dimension metrology, Temperature metrology, Chemically amplified resists

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