Tom Coleman
Member of Technology Staff
SPIE Involvement:
Publications (17)

Proceedings Article | 5 April 2007 Paper
Thomas Marschner, Jan Richter, Uwe Dersch, Amit Moran, Ruthy Katz, David Chase, Reuven Falah, Thomas Coleman
Proceedings Volume 6518, 65181R (2007)
KEYWORDS: Photomasks, Line edge roughness, Computer aided design, Metrology, Signal processing, Critical dimension metrology, Line width roughness, Semiconducting wafers, Edge roughness, Scanning electron microscopy

Proceedings Article | 5 April 2007 Paper
Thomas Marschner, Maik Enger, Frank Ludewig, Reuven Falah, Sergey Latinsky, Ofer Lindman, Thomas Coleman
Proceedings Volume 6518, 65181W (2007)
KEYWORDS: Computer aided design, Scanning electron microscopy, Photomasks, Metrology, Reticles, Pattern recognition, Binary data, Solid modeling, Semiconducting wafers, Target recognition

Proceedings Article | 3 February 2000 Paper
Jan Chabala, Damon Cole, Henry Pearce-Percy, Wayne Phillips, Maiying Lu, Suzanne Weaver, David Alexander, T. Coleman, Charles Sauer, Frank Abboud
Proceedings Volume 3996, (2000)
KEYWORDS: Photomasks, Lithography, Critical dimension metrology, Printing, Error analysis, Photoresist processing, Metrology, Dry etching, Etching, Charged particle optics

Proceedings Article | 30 December 1999 Paper
Juergen Hochmuth, Guenther Ruhl, Thomas Coleman
Proceedings Volume 3873, (1999)
KEYWORDS: Etching, Critical dimension metrology, Dry etching, Photoresist processing, Photomasks, Plasma etching, Data modeling, Diffractive optical elements, Plasma, Helium

Proceedings Article | 23 April 1999 Paper
Robert Dean, David Alexander, Jan Chabala, Thomas Coleman, Caryn Hartglass, Maiying Lu, Charles Sauer, Suzanne Weaver
Proceedings Volume 3665, (1999)
KEYWORDS: Lithography, Edge roughness, Line edge roughness, Photomasks, Etching, Critical dimension metrology, Optical proximity correction, Dry etching, Printing, Metrology

Showing 5 of 17 publications
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