Tom Coleman
Member of Technology Staff at
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Publications (17)

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Reticles, Metrology, Pattern recognition, Scanning electron microscopy, Photomasks, Computer aided design, Target recognition, Semiconducting wafers, Binary data, Solid modeling

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Metrology, Scanning electron microscopy, Signal processing, Photomasks, Line width roughness, Computer aided design, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Edge roughness

PROCEEDINGS ARTICLE | February 3, 2000
Proc. SPIE. 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Lithography, Metrology, Etching, Dry etching, Error analysis, Printing, Photomasks, Critical dimension metrology, Photoresist processing, Charged particle optics

PROCEEDINGS ARTICLE | December 30, 1999
Proc. SPIE. 3873, 19th Annual Symposium on Photomask Technology
KEYWORDS: Diffractive optical elements, Data modeling, Etching, Dry etching, Photomasks, Plasma etching, Helium, Critical dimension metrology, Photoresist processing, Plasma

PROCEEDINGS ARTICLE | April 23, 1999
Proc. SPIE. 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98
KEYWORDS: Lithography, Metrology, Etching, Dry etching, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Line edge roughness, Edge roughness

PROCEEDINGS ARTICLE | December 18, 1998
Proc. SPIE. 3546, 18th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Diffractive optical elements, Etching, Metals, Chromium, Photomasks, Plasma etching, Critical dimension metrology, Reactive ion etching, Standards development, Plasma

Showing 5 of 17 publications
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