Tom Coleman
Member of Technology Staff
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Reticles, Metrology, Pattern recognition, Scanning electron microscopy, Photomasks, Computer aided design, Target recognition, Semiconducting wafers, Binary data, Solid modeling

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Metrology, Scanning electron microscopy, Signal processing, Photomasks, Line width roughness, Computer aided design, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Edge roughness

Proceedings Article | 3 February 2000 Paper
Proc. SPIE. 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Lithography, Metrology, Etching, Dry etching, Error analysis, Printing, Photomasks, Critical dimension metrology, Photoresist processing, Charged particle optics

Proceedings Article | 30 December 1999 Paper
Proc. SPIE. 3873, 19th Annual Symposium on Photomask Technology
KEYWORDS: Diffractive optical elements, Data modeling, Etching, Dry etching, Photomasks, Plasma etching, Helium, Critical dimension metrology, Photoresist processing, Plasma

Proceedings Article | 23 April 1999 Paper
Proc. SPIE. 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98
KEYWORDS: Lithography, Metrology, Etching, Dry etching, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Line edge roughness, Edge roughness

Showing 5 of 17 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top