Dr. Thomas P. Duffey
System Architect at ASML
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Semiconductors, Lithography, Light sources, Optical amplifiers, Optical lithography, Switching, Scanners, Semiconducting wafers, Light, Near field optics

Proceedings Article | 30 July 2002
Proc. SPIE. 4691, Optical Microlithography XV
KEYWORDS: Semiconductors, Lithography, Energy efficiency, Optical lithography, Argon ion lasers, Reliability, Laser applications, Control systems, Semiconducting wafers, Yield improvement

Proceedings Article | 14 September 2001
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Semiconductors, Lithography, Light emitting diodes, Optical lithography, Electrodes, Laser applications, Laser development, Optical coatings, Excimer lasers, Semiconducting wafers

Proceedings Article | 5 July 2000
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Optical design, Beam splitters, Fabry–Perot interferometers, Optical amplifiers, Optical lithography, Resonators, Spectroscopy, Amplifiers, Molybdenum, Diffraction gratings

Proceedings Article | 5 July 2000
Proc. SPIE. 4000, Optical Microlithography XIII
KEYWORDS: Optical components, Fabry–Perot interferometers, Optical lithography, Sensors, Laser applications, Control systems, Laser stabilization, Optics manufacturing, Pulsed power, 193nm lithography

Showing 5 of 7 publications
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