Dr. Thomas J. Dunn
Project Manager at Corning Tropel Corp
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | November 17, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Semiconductors, Lithography, Reticles, Metrology, Error analysis, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Reticles, Scanners, Error analysis, Photomasks, Extreme ultraviolet, Semiconducting wafers, Tolerancing, Data corrections, Overlay metrology

PROCEEDINGS ARTICLE | August 3, 2010
Proc. SPIE. 7790, Interferometry XV: Techniques and Analysis
KEYWORDS: Tunable lasers, Metrology, Modulation, Interferometers, Interferometry, Semiconductor lasers, Modes of laser operation, Assembly tolerances, Assembly equipment, Surface finishing

PROCEEDINGS ARTICLE | April 30, 1999
Proc. SPIE. 3631, Optoelectronic Integrated Circuits and Packaging III
KEYWORDS: Microelectromechanical systems, Lithography, Optical lithography, Imaging systems, Dielectrics, Printing, Optoelectronics, Microelectronics, Photomasks, Excimer lasers

PROCEEDINGS ARTICLE | June 5, 1998
Proc. SPIE. 3331, Emerging Lithographic Technologies II
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Imaging systems, Dielectrics, Lens design, Photoresist materials, Telecommunications, Microelectronics, Photomasks

PROCEEDINGS ARTICLE | June 5, 1998
Proc. SPIE. 3331, Emerging Lithographic Technologies II
KEYWORDS: Lithography, Light sources, Optical lithography, Imaging systems, Image segmentation, Dielectrics, Printing, Microelectronics, Photomasks, Excimer lasers

Showing 5 of 7 publications
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