Thomas B. Faure
Distiguished Member of the Technical Staff at
SPIE Involvement:
Conference Program Committee | Conference Chair | Symposium Chair | Conference Co-Chair | Author | Editor
Publications (32)

Proceedings Article | 4 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Electron beam lithography, Electrons, Manufacturing, Inspection, Image resolution, Photomasks, Extreme ultraviolet, SRAF, Line edge roughness, EUV optics

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Logic, Opacity, Etching, Inspection, Chromium, Attenuators, Photomasks, SRAF, Phase shifts

Proceedings Article | 1 April 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Printing, Transmittance, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Phase modulation, Opacity, Etching, Chromium, Process control, Photomasks, Critical dimension metrology, Line edge roughness, Photoresist processing, Phase shifts

Proceedings Article | 17 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Logic, Switching, Opacity, Etching, Dry etching, Manufacturing, Image resolution, Scanning electron microscopy, SRAF, Critical dimension metrology

Showing 5 of 32 publications
Conference Committee Involvement (12)
Photomask Technology
16 September 2019 | Monterey, California, United States
Photomask Technology
17 September 2018 | Monterey, California, United States
Photomask Technology
11 September 2017 | Monterey, California, United States
Photomask Technology 2014
16 September 2014 | Monterey, California, United States
SPIE Photomask Technology
10 September 2013 | Monterey, California, United States
Showing 5 of 12 Conference Committees
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