Dr. Thomas A. Germer
Physicist/Researcher at National Institute of Standards and Technology
SPIE Involvement:
Author | Instructor | Special Event Speaker
Publications (56)

Proceedings Article | 1 April 2021 Presentation + Paper
Proc. SPIE. 11646, Polarized Light and Optical Angular Momentum for Biomedical Diagnostics
KEYWORDS: Multilayers, Light sources, Biomedical optics, Modulation, Polarization, Calibration, Wave plates, Polarimetry, Liquid crystals, Condition numbers

Proceedings Article | 17 March 2021 Presentation + Paper
Proc. SPIE. 11646, Polarized Light and Optical Angular Momentum for Biomedical Diagnostics
KEYWORDS: Spatial frequencies, Scattering, Scattering media

Proceedings Article | 20 August 2020 Presentation + Paper
Proc. SPIE. 11485, Reflection, Scattering, and Diffraction from Surfaces VII
KEYWORDS: Scattering, Particles, Interfaces, Light scattering, Reflectivity, Bidirectional reflectance transmission function

Proceedings Article | 20 August 2020 Presentation
Proc. SPIE. 11485, Reflection, Scattering, and Diffraction from Surfaces VII
KEYWORDS: Multilayers, Light sources, Modulation, Polarization, Calibration, Wave plates, Polarimetry, Liquid crystals, Condition numbers, Anisotropy

Proceedings Article | 14 May 2018 Presentation + Paper
Proc. SPIE. 10655, Polarization: Measurement, Analysis, and Remote Sensing XIII
KEYWORDS: Data modeling, Polarization, Scattering, Laser scattering, Reflectivity, Refraction, Bidirectional reflectance transmission function, Standards development, Radiative transfer, Absorption

Showing 5 of 56 publications
Conference Committee Involvement (6)
Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors V
24 August 2011 | San Diego, California, United States
Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies III
28 August 2007 | San Diego, California, United States
Optical Fabrication, Testing, and Metrology II
13 September 2005 | Jena, Germany
Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies II
2 August 2005 | San Diego, California, United States
Surface Scattering and Diffraction III
5 August 2003 | San Diego, California, United States
Showing 5 of 6 Conference Committees
Course Instructor
SC492: Predicting, Modeling, and Interpreting Light Scattered by Surfaces
The measurement of light scattered by surfaces can be used to locate and identify roughness, particulates, and defects on a wide variety of materials. Applications include the inspection of silicon wafers, optics, and storage media, characterization of thin film roughness, identification of objects in remote sensing, and prediction of optical system performance. The aim of this course is to provide tools to engineers and scientists to enable them to predict scattering for different sources, differentiate amongst different scattering sources, and to design instrumentation that maximizes sensitivity or differentiation amongst scattering sources for their specific application. Emphasis will be placed on the use of the SCATMECH library of scattering codes and the Modeled Integrated Scatter Tool (MIST) in order to minimize the mathematics that can often be a barrier to those who would otherwise be interested in using optical scatter. The measurement of scatter is emphasized in SC1003 taught by John Stover.
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