Dr. Thomas A. Germer
Physicist/Researcher at National Institute of Standards and Technology
SPIE Involvement:
Fellow status | Conference Program Committee | Author | Instructor
Publications (52)

Proceedings Article | 14 May 2018
Proc. SPIE. 10655, Polarization: Measurement, Analysis, and Remote Sensing XIII
KEYWORDS: Data modeling, Polarization, Scattering, Laser scattering, Reflectivity, Refraction, Bidirectional reflectance transmission function, Standards development, Radiative transfer, Absorption

Proceedings Article | 19 February 2018
Proc. SPIE. 10522, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XVIII
KEYWORDS: Diffraction, Refractive index, Femtosecond phenomena, Laser vision correction, Cornea, Scattering, Light scattering, Scatter measurement, Laser tissue interaction

Proceedings Article | 11 October 2016
Proc. SPIE. 9961, Reflection, Scattering, and Diffraction from Surfaces V
KEYWORDS: Optical spheres, IRIS Consortium, Silica, Scattering, Sensors, Reflectivity, Bidirectional reflectance transmission function, Diffusers, Transmittance, Integrating spheres

Proceedings Article | 26 September 2016
Proc. SPIE. 9961, Reflection, Scattering, and Diffraction from Surfaces V
KEYWORDS: Diffraction, Mueller matrices, Retroreflectors, Polarization, Reflection, Scattering, Silicon, Light scattering, Reflectivity, Bidirectional reflectance transmission function

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Data modeling, Polarization, Sensors, Reflectivity, 3D modeling, Reflectometry, Extreme ultraviolet, Radiation effects, Motion models, EUV optics

Showing 5 of 52 publications
Conference Committee Involvement (6)
Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors V
24 August 2011 | San Diego, California, United States
Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies III
28 August 2007 | San Diego, California, United States
Optical Fabrication, Testing, and Metrology II
13 September 2005 | Jena, Germany
Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies II
2 August 2005 | San Diego, California, United States
Surface Scattering and Diffraction III
5 August 2003 | San Diego, California, United States
Showing 5 of 6 Conference Committees
Course Instructor
SC492: Predicting, Modeling, and Interpreting Light Scattered by Surfaces
The measurement of light scattered by surfaces can be used to locate and identify roughness, particulates, and defects on a wide variety of materials. Applications include the inspection of silicon wafers, optics, and storage media, characterization of thin film roughness, identification of objects in remote sensing, and prediction of optical system performance. The aim of this course is to provide tools to engineers and scientists to enable them to predict scattering for different sources, differentiate amongst different scattering sources, and to design instrumentation that maximizes sensitivity or differentiation amongst scattering sources for their specific application. Emphasis will be placed on the use of the SCATMECH library of scattering codes and the Modeled Integrated Scatter Tool (MIST) in order to minimize the mathematics that can often be a barrier to those who would otherwise be interested in using optical scatter. The measurement of scatter is emphasized in SC1003 taught by John Stover.
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