Thomas Gubiotti
Product Marketing Manager at KLA Corp
SPIE Involvement:
Publications (9)

SPIE Journal Paper | 5 August 2013 Open Access
Luca Grella, Allen Carroll, Kirk Murray, Mark McCord, William Tong, Alan Brodie, Thomas Gubiotti, Fuge Sun, Francoise Kidwingira, Shinichi Kojima, Paul Petric, Christopher Bevis, Bart Vereecke, Luc Haspeslagh, Anil Mane, Jeffrey Elam
JM3, Vol. 12, Issue 03, 031107, (August 2013)
KEYWORDS: Electrodes, Mirrors, Microelectromechanical systems, Semiconducting wafers, Tin, Electron beam lithography, Metals, Aluminum, Coating, Reflectivity

Proceedings Article | 26 March 2013 Paper
Alan Brodie, Shinichi Kojima, Mark McCord, Luca Grella, Thomas Gubiotti, Chris Bevis
Proceedings Volume 8680, 868029 (2013)
KEYWORDS: Electron beam lithography, Monte Carlo methods, Lithography, Line width roughness, Photomasks, Electron beams, Logic, Photoresist processing, Nanoimprint lithography, Semiconductor manufacturing

Proceedings Article | 26 March 2013 Paper
Thomas Gubiotti, Jeff Fuge Sun, Regina Freed, Francoise Kidwingira, Jason Yang, Chris Bevis, Allen Carroll, Alan Brodie, William Tong, Shy-Jay Lin, Wen-Chuan Wang, Luc Haspeslagh, Bart Vereecke
Proceedings Volume 8680, 86800H (2013)
KEYWORDS: Semiconducting wafers, Electron beam lithography, Lithography, Coating, Logic, Electron beams, Polymethylmethacrylate, Printing, Reflectivity, Silica

Proceedings Article | 8 November 2012 Paper
Regina Freed, Thomas Gubiotti, Jeff Sun, Anthony Cheung, Jason Yang, Mark McCord, Paul Petric, Allen Carroll, Upendra Ummethala, Layton Hale, John Hench, Shinichi Kojima, Walter Mieher, Chris Bevis
Proceedings Volume 8522, 85221J (2012)
KEYWORDS: Electron beam lithography, Lithography, Semiconducting wafers, Reflectivity, Logic, YAG lasers, Direct write lithography, Wafer-level optics, Computer aided design, Electron beams

Proceedings Article | 21 March 2012 Paper
Regina Freed, Thomas Gubiotti, Jeff Sun, Francoise Kidwingira, Jason Yang, Upendra Ummethala, Layton Hale, John Hench, Shinichi Kojima, Walter Mieher, Chris Bevis, Shy-Jay Lin, Wen-Chuan Wang
Proceedings Volume 8323, 83230H (2012)
KEYWORDS: Electron beam lithography, Semiconducting wafers, Electroluminescence, Lithography, Monte Carlo methods, Reflectivity, Electron beams, Direct write lithography, Silicon, Computer aided design

Showing 5 of 9 publications
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