Dr. Thomas Henkel
at Qimonda Dresden GmbH & Co OHG
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | May 2, 2008
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Chromatic aberrations, Lithography, Calibration, Scanners, Colorimetry, Photomasks, Optical fiber cables, Computer aided design, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | April 1, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Atrial fibrillation, Calibration, Etching, 3D modeling, Printing, Photomasks, Optical proximity correction, Mask making, 193nm lithography

PROCEEDINGS ARTICLE | June 18, 2007
Proc. SPIE. 6617, Modeling Aspects in Optical Metrology
KEYWORDS: Nanostructures, Diffraction, Optical lithography, Etching, Computer simulations, Finite element methods, Photomasks, Chemical elements, Electromagnetism, Radio propagation

PROCEEDINGS ARTICLE | November 5, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Phase shifting, 3D acquisition, Calibration, Scanners, Error analysis, 3D modeling, Photomasks, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Data modeling, Manufacturing, Scanning electron microscopy, Printing, Data processing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top