Thomas Jakubski
at Advanced Mask Technology Ctr GmbH & Co KG
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | May 27, 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Reticles, Interfaces, Manufacturing, Inspection, Inspection equipment, Photomasks, Factory automation, System integration, Rule based systems, Instrument modeling

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Sensors, Etching, Dry etching, Resistance, Process control, Photomasks, Plasma etching, Critical dimension metrology, Radio frequency circuits, Plasma

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