Dr. Thomas Kämpfe
at Univ Lyon
SPIE Involvement:
Publications (19)

Proceedings Article | 24 May 2022 Poster + Paper
Ratish Rao Nagaraj Rao, Thomas Kämpfe, Frederic Celle, Anton Savchenko, Emilie Gamet, Yves Jourlin
Proceedings Volume 12131, 121310T (2022) https://doi.org/10.1117/12.2621360
KEYWORDS: Spherical lenses, Lithography, Semiconducting wafers, Wavefronts, Wavefront aberrations, Fiber lasers, Silicon, Photoresist materials, 3D printing, Laser sources

SPIE Journal Paper | 9 December 2020 Open Access
Isabelle Verrier, Thomas Kämpfe, Frederic Celle, Anthony Cazier, Koceïla Yadel, Markus Guttmann, Barbara Matthis, Janne Laukkanen, Frédéric Lacour, Colette Veillas, Stéphanie Reynaud, Olivier Parriaux, Yves Jourlin
OE, Vol. 59, Issue 12, 129801, (December 2020) https://doi.org/10.1117/12.10.1117/1.OE.59.12.129801
KEYWORDS: Polarizers, Optical engineering, Physics, Optical testing, Mathematics

Proceedings Article | 2 April 2020 Presentation + Paper
Proceedings Volume 11364, 1136415 (2020) https://doi.org/10.1117/12.2559292
KEYWORDS: Numerical simulations, Modulation, Diffraction gratings, Lithography, Plasmonics, Photoresist materials, Nanostructures, Moire patterns, Apodization

Proceedings Article | 19 September 2018 Paper
Andrei Ushkov, Maxime Bichotte, Isabelle Verrier, Thomas Kampfe, Yves Jourlin
Proceedings Volume 10775, 1077516 (2018) https://doi.org/10.1117/12.2323763
KEYWORDS: Photoresist materials, Lithography, Plasmonics, Photoresist developing, Metals, Diffraction gratings, Plasmons, Polarization, Nanolithography, Numerical simulations

Proceedings Article | 9 May 2018 Presentation + Paper
Thomas Kämpfe, Shamus Husheer, Michael Vervaeke, Mathias Heckele, Isabelle Verrier, Yves Jourlin
Proceedings Volume 10680, 1068011 (2018) https://doi.org/10.1117/12.2307628
KEYWORDS: Projection systems, 3D modeling, Lithium

Showing 5 of 19 publications
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