Thomas Käsebier
at Friedrich-Schiller-Univ Jena
SPIE Involvement:
Author
Publications (19)

PROCEEDINGS ARTICLE | October 31, 2016
Proc. SPIE. 10022, Holography, Diffractive Optics, and Applications VII
KEYWORDS: Lithography, Electron beam lithography, Diffraction, Antireflective coatings, Glasses, Interfaces, Reflectivity, Near field, Photomasks, Stray light

PROCEEDINGS ARTICLE | October 31, 2016
Proc. SPIE. 10022, Holography, Diffractive Optics, and Applications VII
KEYWORDS: Lithography, Electron beam lithography, Diffraction, Optical design, Electron beams, Silica, X-rays, Photoresist materials, Photomasks, X-ray lithography

PROCEEDINGS ARTICLE | September 15, 2016
Proc. SPIE. 9927, Nanoengineering: Fabrication, Properties, Optics, and Devices XIII
KEYWORDS: Mid-IR, Antireflective coatings, Scattering, Etching, Interfaces, Silicon, Coating, Transmittance, Reactive ion etching, Optics manufacturing

PROCEEDINGS ARTICLE | April 21, 2016
Proc. SPIE. 9884, Nanophotonics VI
KEYWORDS: Gold, Apertures, Lithography, Plasmonics, Nanostructures, Lithographic illumination, Polarization, Reflection, Polymers, Glasses, Chromium, Photomasks, Semiconducting wafers, Nanolithography, Absorption

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Lithographic illumination, Silica, Etching, Chromium, Polarizers, Ion beams, Photomasks, Reactive ion etching, Photomicroscopy

PROCEEDINGS ARTICLE | February 19, 2014
Proc. SPIE. 8995, High Contrast Metastructures III
KEYWORDS: Optical components, Reflectors, Refractive index, Fabry–Perot interferometers, Resonators, Silica, Silicon, Reflectivity, Tolerancing, Light wave propagation

Showing 5 of 19 publications
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