Mr. Thomas J. Kinsella Profile

Thomas J. Kinsella

Lithography Process Engineer

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Author

Publications (4)

Proceedings Article | 27 August 2003 Paper

Analysis techniques for investigation of photoresist silylation processes

Thomas Kinsella, Arousian Arshak, Declan McDonagh, Miroslav Mihov, Khalil Arshak, John Fitzgerald

Proceedings Volume 4876, (2003) https://doi.org/10.1117/12.463775

KEYWORDS: Photoresist materials, Photoresist developing, Silicon, Lanthanum, Statistical analysis, Scanning electron microscopy, Standards development, Optical microscopes, Image enhancement, Oxygen

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Proceedings Article | 27 August 2003 Paper

Liquid-phase silylation characterization of Shipley SPR500A-series resists using PRIME top-surface imaging process

Khalil Arshak, Miroslav Mihov, Arousian Arshak, Declan McDonagh, David Sutton, Simon Newcomb, Thomas Kinsella

Proceedings Volume 4876, (2003) https://doi.org/10.1117/12.463645

KEYWORDS: Silicon, Photoresist processing, Scanning electron microscopy, Image processing, Ultraviolet radiation, Absorbance, FT-IR spectroscopy, Spectroscopy, Transmission electron microscopy, Diffusion

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Proceedings Article | 26 April 2001 Paper

STIL II: photoresist silylation simulation using 2D finite element analysis and boundary movement algorithms

Thomas Kinsella, Arousian Arshak, Declan McDonagh

Proceedings Volume 4404, (2001) https://doi.org/10.1117/12.425195

KEYWORDS: Diffusion, Silicon, Finite element methods, Process modeling, Photoresist processing, Chemical elements, Data modeling, Photomasks, Silicon films, Computer simulations

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Proceedings Article | 11 June 1999 Paper

Photoresist silylation and "swelling": simulation using finite element analysis and physical boundary movement algorithms

Arousian Arshak, Thomas Kinsella, Declan McDonagh

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350229

KEYWORDS: Diffusion, Silicon, Photomasks, Photoresist processing, Finite element methods, Chemical elements, Process modeling, Data modeling, Computer simulations, Lithography

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