Dr. Thomas Koehler
Micro R&D Researcher at Dow Advanced Materials
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Diffractive optical elements, Image resolution, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers, Chemically amplified resists

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