Dr. Thomas Koehler Profile

Dr. Thomas Koehler

Micro R&D Researcher at Rohm and Haas Electronic Materials, LLC

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Publications (1)

Proceedings Article | 4 May 2005 Paper

Performance of EUV photoresists on the ALS micro exposure tool

Thomas Koehler, Robert Brainard, Patrick Naulleau, David Van Steenwinckel, Jeroen Lammers, Kenneth Goldberg, Joseph Mackevich, Peter Trefonas

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600511

KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Chemically amplified resists, Lithography, Semiconducting wafers, Image resolution, Scanning electron microscopy, Diffractive optical elements

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