Dr. Tom Lucatorto
Group Leader, Photon Physics Group at National Institute of Standards and Technology
SPIE Involvement:
Publications (28)

Proceedings Article | 16 March 2015 Paper
Proceedings Volume 9422, 94220K (2015) https://doi.org/10.1117/12.2085934
KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet lithography, Extreme ultraviolet, Annealing, Resistance, Oxides, Reflectometry, Silicon, Oxidation

Proceedings Article | 13 March 2015 Paper
Soichi Inoue, Eishi Shiobara, Takeshi Sasami, Isamu Takagi, Yukiko Kikuchi, Toru Fujimori, Shinya Minegishi, Robert Berg, Thomas Lucatorto, Shannon Hill, Charles Tarrio, Ivan Pollentier, Yen-Chih Lin, Yu-Jen Fan, Dominic Ashworth
Proceedings Volume 9422, 942212 (2015) https://doi.org/10.1117/12.2085700
KEYWORDS: Semiconducting wafers, Contamination, Picosecond phenomena, Temperature metrology, Extreme ultraviolet, Molecules, Extreme ultraviolet lithography, Electron beams, Standards development, Lithography

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 90481I (2014) https://doi.org/10.1117/12.2046290
KEYWORDS: Sensors, Extreme ultraviolet, Reflectometry, Polarization, Radiation effects, Reflectivity, Motion models, EUV optics, 3D modeling, Data modeling

Proceedings Article | 18 March 2014 Paper
Proceedings Volume 9048, 90483C (2014) https://doi.org/10.1117/12.2049279
KEYWORDS: Extreme ultraviolet, Reflectivity, Infrared radiation, Extreme ultraviolet lithography, Plasma, Infrared technology, Neodymium, Nickel, Surface finishing, Diffraction gratings

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86790K (2013) https://doi.org/10.1117/12.2011541
KEYWORDS: Semiconducting wafers, Contamination, Electrons, Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Photons, Mirrors, Beam shaping, EUV optics

Showing 5 of 28 publications
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