Dr. Thomas Missalla
Research & Development EUV at JENOPTIK Optical Systems GmbH
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | May 20, 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Mirrors, Metrology, Calibration, Silicon, Lamps, Reflectometry, Extreme ultraviolet, Extreme ultraviolet lithography, Neon, Zirconium

PROCEEDINGS ARTICLE | May 20, 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Optical filters, Mirrors, Spectrographs, Metrology, Sensors, Calibration, Diodes, Transmittance, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | June 16, 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Visualization, Luminescence, Laser development, Laser induced fluorescence, Xenon, Gas lasers, Extreme ultraviolet, Coded apertures, Plasma, Absorption

PROCEEDINGS ARTICLE | June 16, 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Spectrographs, Metrology, Titanium, Photons, Electrons, Silicon, Solids, Extreme ultraviolet, Molybdenum, Beryllium

PROCEEDINGS ARTICLE | June 16, 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Optical filters, Mirrors, Spectrographs, Multilayers, Metrology, Calibration, Photodiodes, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma

SPIE Journal Paper | April 1, 2003
JM3 Vol. 2 Issue 02
KEYWORDS: Extreme ultraviolet, Electrons, Silicon, Solids, Beryllium, Photons, Metrology, X-rays, X-ray technology, Extreme ultraviolet lithography

Showing 5 of 6 publications
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