Thomas Öström
Manager Subsystem Development at Mycronic AB
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Electron beam lithography, Optical lithography, Deep ultraviolet, Calibration, Control systems, Spatial light modulators, Photomasks, Image enhancement, Raster graphics, Neodymium

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Phase shifting, Optical lithography, Deep ultraviolet, Calibration, CCD cameras, Spatial light modulators, Photomasks, Image enhancement, Raster graphics, Neodymium

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Electron beam lithography, Optical lithography, Deep ultraviolet, Quartz, Chromium, Spatial light modulators, Photomasks, Optical alignment, Critical dimension metrology, Neodymium

Proceedings Article | 16 June 2005 Paper
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Electron beam lithography, Optical lithography, Deep ultraviolet, Quartz, CCD cameras, Spatial light modulators, Photomasks, Charge-coupled devices, Optical alignment, Overlay metrology

Proceedings Article | 28 May 2004 Paper
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Optical components, Contamination, Deep ultraviolet, Molecules, Spatial light modulators, Photomasks, Chemical analysis, Molecular lasers, Climatology, Contamination control

Showing 5 of 8 publications
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