Dr. Thomas Scherübl
Director Strategic Business Development at Carl Zeiss SMT GmbH
SPIE Involvement:
Conference Program Committee | Author
Publications (43)

PROCEEDINGS ARTICLE | October 5, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Image processing, Error analysis, Manufacturing, Reliability, Inspection, Image analysis, Image enhancement, Neodymium, Tolerancing, Back end of line

PROCEEDINGS ARTICLE | October 5, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Reticles, Metrology, Deep ultraviolet, Calibration, Databases, Image registration, Photomasks, Extreme ultraviolet, Overlay metrology

SPIE Journal Paper | October 27, 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Scanners, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography, Deep ultraviolet, Atomic force microscopy, Manufacturing

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Lithography, Lithographic illumination, Scanners, Ions, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Metrology, Optical lithography, Lithographic illumination, Image analysis, Image registration, Photomasks, Charge-coupled devices, CCD image sensors, Overlay metrology

PROCEEDINGS ARTICLE | May 27, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Lithography, Image processing, Error analysis, Manufacturing, Reliability, Inspection, Image analysis, Photomasks, Semiconducting wafers, Standards development

Showing 5 of 43 publications
Conference Committee Involvement (16)
Photomask Technology
17 September 2018 | Monterey, California, United States
Photomask Technology
11 September 2017 | Monterey, California, United States
Modeling Aspects in Optical Metrology
26 June 2017 | Munich, Germany
Photomask Technology
12 September 2016 | San Jose, California, United States
Photomask Technology 2015
29 September 2015 | Monterey, California, United States
Showing 5 of 16 published special sections
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