Dr. Thomas Schnattinger
at Fraunhofer IISB
SPIE Involvement:
Publications (6)

Proceedings Article | 19 May 2008 Paper
Proceedings Volume 7028, 70282S (2008) https://doi.org/10.1117/12.793098
KEYWORDS: Semiconducting wafers, Photoresist materials, Data modeling, Photomasks, Scanners, Diffusion, Lithography, Photoresist processing, Calibration, Photoresist developing

Proceedings Article | 1 April 2008 Paper
Proceedings Volume 6924, 692452 (2008) https://doi.org/10.1117/12.772741
KEYWORDS: Semiconducting wafers, Lithography, Refractive index, Double patterning technology, Photomasks, Computer simulations, Optical properties, Photoresist processing, Nonlinear optics, Superposition

Proceedings Article | 26 March 2008 Paper
Proceedings Volume 6923, 69230R (2008) https://doi.org/10.1117/12.772507
KEYWORDS: Line edge roughness, Polymers, Diffusion, Molecules, Materials processing, Photoresist processing, Stochastic processes, Monte Carlo methods, Image quality, Projection systems

Proceedings Article | 27 March 2007 Paper
Proceedings Volume 6520, 65203F (2007) https://doi.org/10.1117/12.709535
KEYWORDS: Visualization, Lithography, Data modeling, Human-machine interfaces, Computer programming, Computer simulations, Computer programming languages, C++, Data conversion, Photoresist materials

Proceedings Article | 2 November 2004 Paper
Proceedings Volume 5558, (2004) https://doi.org/10.1117/12.560085
KEYWORDS: Photomasks, Genetic algorithms, Optimization (mathematics), Manufacturing, Lithography, Critical dimension metrology, Imaging systems, Lithographic illumination, Binary data, Resolution enhancement technologies

Showing 5 of 6 publications
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