Mr. Thomas Schuster
at Univ Stuttgart
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | October 3, 2008
Proc. SPIE. 7155, Ninth International Symposium on Laser Metrology
KEYWORDS: Semiconductors, Lithography, Diffraction, Polarization, Spectroscopy, Computer simulations, Scatterometry, Spectroscopic ellipsometry, Critical dimension metrology, Line edge roughness

PROCEEDINGS ARTICLE | April 25, 2008
Proc. SPIE. 6995, Optical Micro- and Nanometrology in Microsystems Technology II
KEYWORDS: Diffraction, Refractive index, Lithium, Magnetism, Fourier transforms, Image filtering, Aluminum, Raster graphics, 3D image processing, Maxwell's equations

PROCEEDINGS ARTICLE | April 16, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Wafer-level optics, Nanostructures, Diffraction, Defect detection, Polarization, Etching, Manufacturing, Computer simulations, Scanning electron microscopy, Semiconducting wafers

PROCEEDINGS ARTICLE | June 18, 2007
Proc. SPIE. 6617, Modeling Aspects in Optical Metrology
KEYWORDS: Ellipsometry, Diffraction, Polarization, Etching, Scanning electron microscopy, Scatterometry, Spectroscopic ellipsometry, Picosecond phenomena, Jones vectors, Systems modeling

PROCEEDINGS ARTICLE | September 10, 2004
Proc. SPIE. 5457, Optical Metrology in Production Engineering
KEYWORDS: Mathematical modeling, 3D acquisition, Imaging systems, Calibration, Distortion, Clouds, CCD cameras, Signal processing, 3D metrology, Ronchi rulings

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