Thomas Sebald
President
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | May 27, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Reticles, Clocks, Sensors, Quartz, Glasses, Manufacturing, Photomasks, Manufacturing equipment, Semiconducting wafers, Mask cleaning

PROCEEDINGS ARTICLE | December 11, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Reticles, Metrology, Clocks, Sensors, Quartz, Glasses, Ionization, Photomasks, Semiconducting wafers, Mask cleaning

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Semiconductors, Reticles, Clocks, Capacitors, Sensors, Calibration, Quartz, Glasses, Control systems, Data analysis

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Reticles, Capacitors, Quartz, Electrodes, Metals, Glasses, Manufacturing, Measurement devices, Photomasks, Semiconductor manufacturing

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