Dr. Thomas I. Wallow
SPIE Involvement:
Conference Program Committee | Author | Editor
Publications (86)

Proceedings Article | 22 November 2023 Presentation
Thomas Wallow, Aiqin Jiang, Ton Kiers, Tim Houben, Chris Spence
Proceedings Volume PC12750, PC127500C (2023) https://doi.org/10.1117/12.2687837
KEYWORDS: Scanning electron microscopy, Defect detection, Extreme ultraviolet, Machine learning, Inspection

Proceedings Article | 22 November 2023 Presentation
Cyrus Tabery, Miao Wang, Victor Blanco Carballo, Eren Canga, Aiqin Jiang, Chris Spence, Tom Wallow
Proceedings Volume PC12750, PC127500B (2023) https://doi.org/10.1117/12.2688141
KEYWORDS: Electron beam lithography, Metrology, Design and modelling, Scanning laser ophthalmoscopy, Scanning electron microscopy, Line width roughness, Image enhancement, Failure analysis, Extreme ultraviolet, Etching

Proceedings Article | 21 November 2023 Presentation + Paper
Proceedings Volume 12750, 127500E (2023) https://doi.org/10.1117/12.2687699
KEYWORDS: Optical proximity correction, Semiconducting wafers, Extreme ultraviolet, Data modeling, Calibration, Metrology, Finite element methods, Critical dimension metrology, Contour modeling, Computer simulations

Proceedings Article | 1 December 2022 Presentation + Paper
Adam Lyons, Tom Wallow, Dong-Seok Nam, Gisung Yoon, Baorui Yang, Mike Hermes
Proceedings Volume 12293, 122930M (2022) https://doi.org/10.1117/12.2643523
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Reticles, Stochastic processes, Metrology, Extreme ultraviolet lithography, Image analysis

Proceedings Article | 16 September 2022 Paper
Maxence Delorme, Werner Gillijns, Christoph Hennerkes, Emily Gallagher, Adam Lyons, Mahmoud Mohsen, Tom Wallow
Proceedings Volume 12325, 123250L (2022) https://doi.org/10.1117/12.2642867
KEYWORDS: Photomasks, Optical proximity correction, Metrology, Scanning electron microscopy, Logic, Distortion, Extreme ultraviolet, Critical dimension metrology

Showing 5 of 86 publications
Proceedings Volume Editor (4)

SPIE Conference Volume | 23 April 2015

SPIE Conference Volume | 16 April 2014

SPIE Conference Volume | 18 April 2013

SPIE Conference Volume | 27 April 2012

Conference Committee Involvement (27)
Optical and EUV Nanolithography XXXVII
26 February 2024 | San Jose, California, United States
Optical and EUV Nanolithography XXXVI
27 February 2023 | San Jose, California, United States
Optical and EUV Nanolithography XXXV
25 April 2022 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIX
25 April 2022 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography XII
22 February 2021 | Online Only, California, United States
Showing 5 of 27 Conference Committees
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