Dr. Thomas I. Wallow
at ASML Silicon Valley
SPIE Involvement:
Conference Program Committee | Author | Editor
Publications (76)

Proceedings Article | 22 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Data modeling, Calibration, Image processing, Error analysis, Scanning electron microscopy, Time metrology, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Lithography, Microscopes, Optical lithography, Image segmentation, Reflectivity, Image analysis, 3D metrology, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 28 April 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Signal to noise ratio, Metrology, Optical lithography, Data modeling, Calibration, Metals, Image analysis, Optical proximity correction, OLE for process control, Instrument modeling

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Mathematical modeling, Metrology, Optical lithography, Data modeling, Visualization, Calibration, Error analysis, Distortion, Scanning electron microscopy, Image quality, Distance measurement, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing, Performance modeling, Data corrections

Proceedings Article | 27 March 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Oxides, Metrology, Data modeling, Calibration, Etching, Metals, Resistance, Photoresist materials, Finite element methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers, Back end of line

Showing 5 of 76 publications
Proceedings Volume Editor (4)

SPIE Conference Volume | 23 April 2015

SPIE Conference Volume | 16 April 2014

SPIE Conference Volume | 18 April 2013

SPIE Conference Volume | 27 April 2012

Conference Committee Involvement (23)
Advances in Patterning Materials and Processes XXXVIII
21 February 2021 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography XII
21 February 2021 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXVII
24 February 2020 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography XI
24 February 2020 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Showing 5 of 23 Conference Committees
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