Thorsten Krome
at Advanced Mask Technology Center GmbH & Co. KG
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | September 19, 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Deep ultraviolet, Opacity, Chemistry, Printing, Photomasks, Ozone, Semiconducting wafers, Binary data, Mask cleaning, Phase shifts

PROCEEDINGS ARTICLE | June 12, 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Etching, Ultraviolet radiation, Manufacturing, Reflectivity, Atomic force microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Carbon dioxide, Contamination, Diffractive optical elements, Particles, Scanning electron microscopy, Photomasks, SRAF, Raster graphics, Cryogenics, Mask cleaning

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