Dr. Thuc Dam
Sr. Staff CAE at Synopsys Inc
SPIE Involvement:
Author
Publications (24)

Proceedings Article | 4 April 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Optical proximity correction, Optical lithography, Manufacturing, Photomasks, Semiconducting wafers, Atrial fibrillation, Source mask optimization, Image processing

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: 3D modeling, Optical proximity correction, Optical lithography, Data modeling, Computational lithography, Optimization (mathematics), Photoresist processing, Source mask optimization, Scanning electron microscopy

Proceedings Article | 31 March 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Photomasks, Lithography, Source mask optimization, Photovoltaics, Calibration, Lens design, Process modeling, Performance modeling, Neck, Directed self assembly

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Photomasks, Lithography, Double patterning technology, Metals, Immersion lithography, Source mask optimization, Etching, Fiber optic illuminators, Manufacturing, SRAF

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Scanning electron microscopy, Photomasks, Semiconducting wafers, Calibration, Critical dimension metrology, Optical proximity correction, Image processing, Signal to noise ratio, Mask making, Holons

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Photomasks, Lithography, Fiber optic illuminators, Double patterning technology, Mask making, Image segmentation, Back end of line, Source mask optimization, Computational lithography, Metals

Showing 5 of 24 publications
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