Dr. Thuc Dam
Sr. Staff CAE at Synopsys Inc
SPIE Involvement:
Author
Publications (26)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Light scattering, Reflectivity, Electroluminescence, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Nanoimprint lithography, Critical dimension metrology

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Lithography, Photovoltaics, Scanning electron microscopy, Photomasks, Source mask optimization, Optical proximity correction, Nanoimprint lithography, Optimization (mathematics), Semiconducting wafers, Resolution enhancement technologies

Proceedings Article | 4 April 2017 Presentation + Paper
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Optical lithography, Atrial fibrillation, Image processing, Manufacturing, Photomasks, Source mask optimization, Optical proximity correction, Semiconducting wafers

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Data modeling, 3D modeling, Scanning electron microscopy, Source mask optimization, Computational lithography, Optical proximity correction, Optimization (mathematics), Photoresist processing

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Neck, Lithography, Photovoltaics, Calibration, Lens design, Photomasks, Directed self assembly, Source mask optimization, Performance modeling, Process modeling

Showing 5 of 26 publications
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