Dr. Thuy Do
Technical Martketing Engr
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 17 March 2015
Proc. SPIE. 9428, Advanced Etch Technology for Nanopatterning IV
KEYWORDS: Semiconductors, Lithography, Calibration, Etching, 3D modeling, Photoresist materials, Optical proximity correction, Critical dimension metrology, Tolerancing, 3D image processing

Proceedings Article | 1 October 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Data modeling, Modulation, Calibration, Silicon, 3D modeling, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Active optics

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Oxides, Optical lithography, Data modeling, Calibration, Silicon, 3D modeling, Scanning electron microscopy, Photomasks, Semiconducting wafers, Process modeling

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Data modeling, Visualization, Calibration, Scanning electron microscopy, Image quality, Photomasks, Optical proximity correction, Critical dimension metrology, Panoramic photography, Semiconducting wafers

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Oxides, Data modeling, Calibration, Reflectivity, Photoresist materials, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design

Showing 5 of 19 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top