Tim Chen
Product & Applications Manager
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Optical lithography, Lithographic illumination, Diffractive optical elements, Manufacturing, Electroluminescence, Printing, Photomasks, Optical proximity correction, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 15 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Reticles, Eye, Optical lithography, Lithographic illumination, Electroluminescence, Printing, Photomasks, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 15 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Optical lithography, Diffractive optical elements, Polarization, Electroluminescence, Printing, Finite element methods, Photomasks, Optical proximity correction, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 8 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Optical lithography, Lithographic illumination, Manufacturing, Electroluminescence, Printing, Photomasks, Optical proximity correction, Nanoimprint lithography, Cerium, Fiber optic illuminators

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Data modeling, Calibration, Diffusion, 3D modeling, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Process modeling

Showing 5 of 11 publications
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