Tim Toepfer
at GE Global Research
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 30 August 2019
Proc. SPIE. 11104, Current Developments in Lens Design and Optical Engineering XX
KEYWORDS: Etching, Silicon, Lens design, Semiconductor lasers, Scanning electron microscopy, Photoresist materials, Collimation, Fresnel lenses, Tolerancing, Grayscale lithography

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