Timothy L. Bittleston
at Photronics Inc
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Statistical analysis, Cadmium, Error analysis, Process control, Photomasks, Analytical research, Critical dimension metrology, Semiconducting wafers, Statistical modeling, Photomask technology

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