Dr. Timothy A. Brunner
Fellow at GLOBALFOUNDRIES Inc
SPIE Involvement:
Fellow status | Symposium Committee | Symposium Chair | Conference Chair | Author | Editor
Area of Expertise:
microlithography , optical lithography , process control , IC production lithography
Profile Summary

For the past 35 years, I have been working in the area of lithographic patterning for IC production - a most fascinating, interdisciplinary area. Some particular interests include advanced image formation, simulation, process control, metrology methods and data analysis.
I have a B.A. from Carleton College in 1975 and a doctorate from MIT in 1980, both in physics. Before joining GLOBALFOUNDRIES in 2015, I worked for IBM, Perkin-Elmer Corporation and Xerox PARC.
Publications (69)

PROCEEDINGS ARTICLE | March 30, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Semiconductors, Cadmium, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Stochastic processes, Overlay metrology

PROCEEDINGS ARTICLE | March 27, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Speckle, Image processing, Scanners, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Reticles, Inspection, Scanning electron microscopy, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Edge detection, Metrology, Statistical analysis, Error analysis, Computer simulations, Scanning electron microscopy, Photoresist materials, Image quality, Process control, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Edge roughness, Line scan image sensors, Correlation function

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Multilayers, Reticles, Opacity, Silicon, Coating, Reflectivity, Scanning electron microscopy, Pellicles, Bridges, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Molybdenum, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Logic, Statistical analysis, Cadmium, Modulation, Photons, Image quality, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Failure analysis, Stochastic processes, 193nm lithography

Showing 5 of 69 publications
Conference Committee Involvement (15)
SPIE Advanced Lithography
21 February 2016 | San Jose, United States
SPIE Advanced Lithography
23 February 2014 | San Jose, United States
SPIE Advanced Lithography
24 February 2013 | San Jose, United States
SPIE Advanced Lithography
12 February 2012 | San Jose, United States
Intnl conference on electron, ion and photon beam tech and nanofabrication
31 May 2011 |
Showing 5 of 15 published special sections
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