Dr. Timothy A. Brunner
Principle Application Engineer
SPIE Involvement:
Area of Expertise:
microlithography , optical lithography , process control , IC production lithography
Profile Summary

Since 1980, I have been working in the area of lithographic patterning for IC production - a most fascinating, interdisciplinary area. Some particular interests include advanced image formation, simulation, process control, metrology methods, data analysis, and EUV lithography.
I have a B.A. from Carleton College in 1975 and a doctorate from MIT in 1980, both in physics. Before joining ASML in 2019, I worked for GLOBALFOUNDRIES, IBM, Xerox PARC and Perkin-Elmer Corporation.
Publications (82)

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12953, 1295302 (2024) https://doi.org/10.1117/12.3009996
KEYWORDS: Photomasks, Light sources and illumination, Source mask optimization, Lithography, Near field, Diffraction

Proceedings Article | 21 November 2023 Presentation + Paper
Proceedings Volume 12750, 1275006 (2023) https://doi.org/10.1117/12.2685543
KEYWORDS: Semiconducting wafers, Stochastic processes, Nanoimprint lithography, Printing, Line width roughness, Simulations, Optical lithography, Extreme ultraviolet lithography, Scanning electron microscopy, Extreme ultraviolet

Proceedings Article | 1 December 2022 Presentation + Paper
Proceedings Volume 12292, 122920A (2022) https://doi.org/10.1117/12.2640647
KEYWORDS: Photoresist processing, Metrology, Stochastic processes, Extreme ultraviolet lithography, Lithographic process control

SPIE Journal Paper | 20 July 2022
JM3, Vol. 21, Issue 03, 030501, (July 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.3.030501
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Diffraction, Scanners, 3D image processing, Solids, Fiber optic illuminators, Switches

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12051, PC1205108 (2022) https://doi.org/10.1117/12.2614174
KEYWORDS: Extreme ultraviolet, Refractive index, Nanoimprint lithography, High volume manufacturing, Extreme ultraviolet lithography, Diffraction, 3D printing, 3D image processing

Showing 5 of 82 publications
Proceedings Volume Editor (2)

SPIE Conference Volume | 26 May 1995

SPIE Conference Volume | 17 May 1994

Conference Committee Involvement (15)
SPIE Advanced Lithography
21 February 2016 | San Jose, United States
SPIE Advanced Lithography
23 February 2014 | San Jose, United States
SPIE Advanced Lithography
24 February 2013 | San Jose, United States
SPIE Advanced Lithography
12 February 2012 | San Jose, United States
Intnl conference on electron, ion and photon beam tech and nanofabrication
31 May 2011 |
Showing 5 of 15 Conference Committees
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top