Dr. Timothy A. Brunner
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SPIE Involvement:
Fellow status | Symposium Committee | Symposium Chair | Conference Chair | Author
Area of Expertise:
microlithography , optical lithography , process control , IC production lithography
Profile Summary

For the past 35 years, I have been working in the area of lithographic patterning for IC production - a most fascinating, interdisciplinary area. Some particular interests include advanced image formation, simulation, process control, metrology methods and data analysis.
I have a B.A. from Carleton College in 1975 and a doctorate from MIT in 1980, both in physics. Before joining GLOBALFOUNDRIES in 2015, I worked for IBM, Perkin-Elmer Corporation and Xerox PARC.
Publications (74)

PROCEEDINGS ARTICLE | October 24, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Optical lithography, Contamination, Reliability, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Chemically amplified resists

PROCEEDINGS ARTICLE | October 9, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Monochromatic aberrations, Metrology, Principal component analysis, Detection and tracking algorithms, Imaging systems, Wavefronts, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | September 24, 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Critical dimension metrology, Extreme ultraviolet, Optical proximity correction, Semiconducting wafers, Line edge roughness, Stochastic processes, Extreme ultraviolet lithography, Cadmium, Semiconductors, Overlay metrology

SPIE Journal Paper | September 17, 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Photomasks, Semiconducting wafers, Reticles, Extreme ultraviolet, Stochastic processes, Lithography, Printing, Pellicles, Scanning electron microscopy, Extreme ultraviolet lithography

SPIE Journal Paper | September 17, 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Line width roughness, Photomasks, Extreme ultraviolet, Semiconducting wafers, Scanning electron microscopy, Stochastic processes, Speckle, Scanners, Extreme ultraviolet lithography, Metrology

PROCEEDINGS ARTICLE | March 30, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Semiconductors, Cadmium, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Stochastic processes, Overlay metrology

Showing 5 of 74 publications
Conference Committee Involvement (15)
SPIE Advanced Lithography
21 February 2016 | San Jose, United States
SPIE Advanced Lithography
23 February 2014 | San Jose, United States
SPIE Advanced Lithography
24 February 2013 | San Jose, United States
SPIE Advanced Lithography
12 February 2012 | San Jose, United States
Intnl conference on electron, ion and photon beam tech and nanofabrication
31 May 2011 |
Showing 5 of 15 published special sections
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