Dr. Timothy A. Brunner
Director at ASML Technology Development Center
SPIE Involvement:
Author
Area of Expertise:
microlithography , optical lithography , process control , IC production lithography
Profile Summary

For the past 35 years, I have been working in the area of lithographic patterning for IC production - a most fascinating, interdisciplinary area. Some particular interests include advanced image formation, simulation, process control, metrology methods and data analysis.
I have a B.A. from Carleton College in 1975 and a doctorate from MIT in 1980, both in physics. Before joining GLOBALFOUNDRIES in 2015, I worked for IBM, Perkin-Elmer Corporation and Xerox PARC.
Publications (74)

Proceedings Article | 14 April 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Scanners, Photons, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Convolution, Line edge roughness, Stochastic processes

SPIE Journal Paper | 30 November 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Stochastic processes, Optical lithography, Integrated circuits, Line edge roughness, Extreme ultraviolet lithography, Line width roughness, Metrology, Critical dimension metrology, Photomasks, Semiconducting wafers

Proceedings Article | 24 October 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Optical lithography, Contamination, Reliability, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Chemically amplified resists

Proceedings Article | 9 October 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Lithography, Monochromatic aberrations, Metrology, Principal component analysis, Detection and tracking algorithms, Imaging systems, Wavefronts, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

SPIE Journal Paper | 24 September 2018
JM3 Vol. 17 Issue 04
KEYWORDS: Critical dimension metrology, Extreme ultraviolet, Optical proximity correction, Semiconducting wafers, Line edge roughness, Stochastic processes, Extreme ultraviolet lithography, Cadmium, Semiconductors, Overlay metrology

Showing 5 of 74 publications
Proceedings Volume Editor (2)

SPIE Conference Volume | 26 May 1995

SPIE Conference Volume | 17 May 1994

Conference Committee Involvement (15)
SPIE Advanced Lithography
21 February 2016 | San Jose, United States
SPIE Advanced Lithography
23 February 2014 | San Jose, United States
SPIE Advanced Lithography
24 February 2013 | San Jose, United States
SPIE Advanced Lithography
12 February 2012 | San Jose, United States
Intnl conference on electron, ion and photon beam tech and nanofabrication
31 May 2011 |
Showing 5 of 15 Conference Committees
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