Mr. Timothy Farrell
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | June 11, 1999
Proc. SPIE. 3678, Advances in Resist Technology and Processing XVI
KEYWORDS: Oxides, Lithography, Optical lithography, Optical properties, Etching, Resistance, Electroluminescence, Printing, Photomasks, Phase shifts

PROCEEDINGS ARTICLE | July 7, 1997
Proc. SPIE. 3051, Optical Microlithography X
KEYWORDS: Semiconductors, Lithography, Optical lithography, Lithographic illumination, Manufacturing, Software development, Photomasks, Photoresist processing, Optics manufacturing, Prototyping

PROCEEDINGS ARTICLE | July 7, 1997
Proc. SPIE. 3049, Advances in Resist Technology and Processing XIV
KEYWORDS: Lithography, Etching, Polymers, Glasses, Annealing, Silicon, Resistance, Photoresist materials, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | June 7, 1996
Proc. SPIE. 2726, Optical Microlithography IX
KEYWORDS: Semiconductors, Lithography, Monochromatic aberrations, Lithographic illumination, Reflectivity, Photomasks, Excimer lasers, Photomicroscopy, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | December 8, 1995
Proc. SPIE. 2621, 15th Annual BACUS Symposium on Photomask Technology and Management
KEYWORDS: Semiconductors, Lithography, Manufacturing, Scanning electron microscopy, Photomasks, Optical proximity correction, Sodium, Critical dimension metrology, Semiconducting wafers, Tolerancing

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