Timothy Farrell
SPIE Involvement:
Publications (5)

Proceedings Article | 11 June 1999 Paper
Zhijian Lu, Yuping Cui, Alan Thomas, Scott Mansfield, Gerhard Kunkel, David Dobuzinsky, Franz Zach, Daniel Liu, K. Rex Chen, George Jordhamo, Alois Gutmann, Timothy Farrell
Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350280
KEYWORDS: Printing, Etching, Photomasks, Oxides, Phase shifts, Lithography, Optical lithography, Optical properties, Electroluminescence, Resistance

Proceedings Article | 7 July 1997 Paper
Will Conley, William Brunsvold, Fred Buehrer, Ronald DellaGuardia, David Dobuzinsky, Timothy Farrell, Hok Ho, Ahmad Katnani, Robin Keller, James Marsh, Paul Muller, Ronald Nunes, Hung Ng, James Oberschmidt, Michael Pike, Deborah Ryan, Tina Cotler-Wagner, Ron Schulz, Hiroshi Ito, Donald Hofer, Gregory Breyta, Debra Fenzel-Alexander, Gregory Wallraff, Juliann Opitz, James Thackeray, George Barclay, James Cameron, Tracy Lindsay, Michael Cronin, Matthew Moynihan, Sassan Nour, Jacque Georger, Mike Mori, Peter Hagerty, Roger Sinta, Thomas Zydowsky
Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275830
KEYWORDS: Semiconducting wafers, Photoresist materials, Etching, Polymers, Resistance, Lithography, Silicon, Glasses, Annealing, Photoresist processing

Proceedings Article | 7 July 1997 Paper
Timothy Farrell, Ronald Nunes, Donald Samuels, Alan Thomas, Richard Ferguson, Antoinette Molless, Alfred Wong, Will Conley, Donald Wheeler, Santo Credendino, Munir Naeem, Peter Hoh, Zhijian Lu
Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275974
KEYWORDS: Lithography, Optical lithography, Optics manufacturing, Photoresist processing, Photomasks, Software development, Semiconductors, Prototyping, Manufacturing, Lithographic illumination

Proceedings Article | 7 June 1996 Paper
Timothy Farrell, Ronald Nunes, Robert Campbell, Peter Hoh, Donald Samuels, Joseph Kirk, Will Conley, Junichiro Iba, Tsuyoshi Shibata
Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240943
KEYWORDS: Lithography, Monochromatic aberrations, Photoresist processing, Semiconductors, Photomasks, Lithographic illumination, Excimer lasers, Semiconducting wafers, Photomicroscopy, Reflectivity

Proceedings Article | 8 December 1995 Paper
Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228213
KEYWORDS: Photomasks, Optical proximity correction, Critical dimension metrology, Lithography, Sodium, Semiconducting wafers, Tolerancing, Scanning electron microscopy, Manufacturing, Semiconductors

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