Timothy Lin
at Mentor Graphics Corp
SPIE Involvement:
Author
Publications (15)

SPIE Journal Paper | 2 December 2013
JM3 Vol. 13 Issue 01
KEYWORDS: Photomasks, Semiconducting wafers, 3D modeling, Optical proximity correction, Critical dimension metrology, Calibration, Photoresist materials, Computational lithography, Data modeling, Mathematical modeling

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Data modeling, Calibration, Manufacturing, 3D modeling, Photomasks, Computational lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Process modeling

Proceedings Article | 30 June 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Lithography, Visualization, Diffusion, Manufacturing, Inspection, Photomasks, Source mask optimization, Critical dimension metrology, Line edge roughness, Semiconducting wafers

Proceedings Article | 17 April 2012
Proc. SPIE. 8352, 28th European Mask and Lithography Conference
KEYWORDS: Lithography, Manufacturing, Inspection, Data processing, Photomasks, Optical proximity correction, Forward error correction, Semiconducting wafers, Model-based design, Resolution enhancement technologies

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Data modeling, Manufacturing, Inspection, Photomasks, Optical proximity correction, Optical alignment, Forward error correction, Semiconducting wafers, Model-based design

Showing 5 of 15 publications
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