Dr. Timothy B. Michaelson
Senior Member of Technical Staff at Applied Materials Inc
SPIE Involvement:
Publications (9)

Proceedings Article | 1 April 2009 Paper
Lu Chen, Nikolaos Bekiaris, Timothy Michaelson, Glen Mori
Proceedings Volume 7273, 72730F (2009) https://doi.org/10.1117/12.814359
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Lithography, Temperature metrology, Optical lithography, Resolution enhancement technologies, Industrial chemicals, Chemical reactions, Photoresist materials, Extreme ultraviolet lithography

SPIE Journal Paper | 1 March 2009
OE, Vol. 48, Issue 03, 037201, (March 2009) https://doi.org/10.1117/12.10.1117/1.3099722
KEYWORDS: Sensors, Pattern recognition, Optical pattern recognition, Biosensors, Detection and tracking algorithms, Optical engineering, Optical alignment, Target recognition, Luminescence, Optical lithography

Proceedings Article | 15 April 2008 Paper
Timothy Michaelson, Junyan Dai, Lu Chen, Hiram Cervera, Brian Lue, Harald Herchen, Kim Vellore, Nikolaos Bekiaris
Proceedings Volume 6923, 69233M (2008) https://doi.org/10.1117/12.772894
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Particles, Lithography, Scanners, Scanning electron microscopy, Wafer testing, Lutetium, Metrology, Silicon films

SPIE Journal Paper | 1 April 2006
JM3, Vol. 5, Issue 02, 023001, (April 2006) https://doi.org/10.1117/12.10.1117/1.2200675
KEYWORDS: Line edge roughness, Polymers, Diffusion, Data modeling, Optical lithography, Image quality, Systems modeling, Photoresist materials, Chemical analysis, Scanning electron microscopy

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599848
KEYWORDS: Line edge roughness, Photoresist materials, Polymers, Diffusion, Data modeling, Semiconducting wafers, Scanning electron microscopy, Image processing, Data conversion, Mathematical modeling

Showing 5 of 9 publications
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