Dr. Timothy B. Michaelson
Senior Member of Technical Staff at Applied Materials Inc
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Optical lithography, Photoresist materials, Extreme ultraviolet lithography, Chemical reactions, Critical dimension metrology, Semiconducting wafers, Industrial chemicals, Resolution enhancement technologies, Temperature metrology

SPIE Journal Paper | 1 March 2009
OE Vol. 48 Issue 03
KEYWORDS: Sensors, Pattern recognition, Optical pattern recognition, Biosensors, Detection and tracking algorithms, Optical engineering, Optical alignment, Target recognition, Luminescence, Optical lithography

Proceedings Article | 15 April 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Metrology, Scanners, Particles, Scanning electron microscopy, Silicon films, Lutetium, Critical dimension metrology, Semiconducting wafers, Wafer testing

SPIE Journal Paper | 1 April 2006
JM3 Vol. 5 Issue 02
KEYWORDS: Line edge roughness, Polymers, Diffusion, Data modeling, Optical lithography, Image quality, Systems modeling, Photoresist materials, Chemical analysis, Scanning electron microscopy

Proceedings Article | 4 May 2005 Paper
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Polymers, Molecules, Diffusion, Computer simulations, Photoresist materials, Monte Carlo methods, Image quality, Line edge roughness, Stochastic processes

Showing 5 of 9 publications
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