Mr. Timothy J. Wiltshire Profile

Timothy J. Wiltshire

Member/Senior Technical Staff at GLOBALFOUNDRIES Inc

SPIE Involvement:

Author

Publications (17)

SPIE Journal Paper | 2 May 2016

Intrafield overlay correction for illumination-based distortion

Michael Pike, Timothy Brunner, Bradley Morgenfeld, Nan Jing, Timothy Wiltshire

JM3, Vol. 15, Issue 02, 021406, (May 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021406

KEYWORDS: Overlay metrology, Distortion, Scanners, Reticles, Image processing, Semiconducting wafers, Error analysis, Optical alignment, Photomasks, Calibration

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Proceedings Article | 18 March 2015 Paper

Intra-field overlay correction for illumination based distortion

Michael Pike, Timothy Brunner, Bradley Morgenfeld, Nan Jing, Timothy Wiltshire

Proceedings Volume 9426, 942613 (2015) https://doi.org/10.1117/12.2085887

KEYWORDS: Overlay metrology, Scanners, Distortion, Reticles, Semiconducting wafers, Optical lithography, Photomasks, Optical alignment, Lithographic illumination, Error analysis

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Proceedings Article | 10 April 2013 Paper

CD optimization methodology for extending optical lithography

C. Wong, G. Seevaratnam, T. Wiltshire, N. Felix, T. Brunner, P. Rawat, M. Escalante, W. Kim, E. Rottenkolber, A. Elmalk, V. Wang, C. Leewis, P. Hinnen

Proceedings Volume 8681, 868137 (2013) https://doi.org/10.1117/12.2009397

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scatterometry, Metrology, Photomasks, Etching, Scatter measurement, Scanning electron microscopy, Lithography, Semiconductors

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Proceedings Article | 4 April 2012 Paper

High-order wafer alignment in manufacturing

Michael Pike, Nelson Felix, Vinayan Menon, Christopher Ausschnitt, Timothy Wiltshire, Sheldon Meyers, Won Kim, Blandine Minghetti

Proceedings Volume 8324, 832408 (2012) https://doi.org/10.1117/12.916483

KEYWORDS: Optical alignment, Semiconducting wafers, Overlay metrology, Scanners, Manufacturing, Control systems, Semiconductor manufacturing, Data modeling, Process control, Metrology

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Proceedings Article | 2 April 2010 Paper

Application of automated topography focus corrections for volume manufacturing

Timothy Wiltshire, Bernhard Liegl, Emily Hwang, Mark Lucksinger

Proceedings Volume 7638, 76380F (2010) https://doi.org/10.1117/12.846652

KEYWORDS: Lithography, Metals, Wafer-level optics, Semiconducting wafers, Optical calibration, Semiconductors, Manufacturing, Data corrections, Optics manufacturing, Logic

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Proceedings Article | 4 March 2010 Paper

The GridMapper challenge: how to integrate into manufacturing for reduced overlay error

Allen Gabor, Bernhard Liegl, Michael Pike, Emily Hwang, Timothy Wiltshire

Proceedings Volume 7640, 764015 (2010) https://doi.org/10.1117/12.849225

KEYWORDS: Overlay metrology, Semiconducting wafers, Scanners, Manufacturing, Reticles, Lithography, Optics manufacturing, Laser scanners, 3D scanning, Software development

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Proceedings Article | 23 March 2009 Paper

Manufacturing implementation of scatterometry and other techniques for 300-mm lithography tool controls

T. Wiltshire, D. Corliss, T. Brunner, C. Ausschnitt, R. Young, R. Nielson, E. Hwang, J. Iannucci

Proceedings Volume 7272, 72720W (2009) https://doi.org/10.1117/12.812287

KEYWORDS: Semiconducting wafers, Scatterometry, Lithography, Control systems, Scanners, Metrology, Deconvolution, Finite element methods, Manufacturing, Overlay metrology

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Proceedings Article | 16 March 2009 Paper

Focus and dose characterization of immersion photoclusters

T. Brunner, D. Corliss, T. Wiltshire, C. Ausschnitt

Proceedings Volume 7274, 72740S (2009) https://doi.org/10.1117/12.812786

KEYWORDS: Semiconducting wafers, Reticles, Metrology, Resolution enhancement technologies, Critical dimension metrology, Data modeling, Immersion lithography, Finite element methods, Lithography, Deconvolution

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Proceedings Article | 7 March 2008 Paper

Determining DOF requirements needed to meet technology process assumptions

Allen Gabor, Andrew Brendler, Bernhard Liegl, Colin Brodsky, Gerhard Lembach, Scott Mansfield, Shailendra Mishra, Timothy Brunner, Timothy Wiltshire, Vinayan Menon, Wai-kin Li

Proceedings Volume 6924, 69241L (2008) https://doi.org/10.1117/12.773070

KEYWORDS: Critical dimension metrology, Tolerancing, Lithography, Photomasks, Scanners, Semiconducting wafers, Electroluminescence, Optical lithography, Error analysis, Reactive ion etching

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SPIE Journal Paper | 1 October 2006

Laser bandwidth and other sources of focus blur in lithography

Timothy Brunner, Daniel Corliss, Shahid Butt, Timothy Wiltshire, Christopher Ausschnitt, Mark Smith

JM3, Vol. 5, Issue 04, 043003, (October 2006) https://doi.org/10.1117/12.10.1117/1.2396926

KEYWORDS: Lithography, Optical proximity correction, Critical dimension metrology, Excimer lasers, Optical simulations, Colorimetry, Image processing, Semiconducting wafers, Photoresist processing, Imaging systems

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Proceedings Article | 15 March 2006 Paper

Laser bandwidth and other sources of focus blur in lithography

T. Brunner, D. Corliss, S. Butt, T. Wiltshire, C. Ausschnitt, M. Smith

Proceedings Volume 6154, 61540V (2006) https://doi.org/10.1117/12.656520

KEYWORDS: Lithography, Optical proximity correction, Critical dimension metrology, SRAF, Excimer lasers, Colorimetry, Image processing, Semiconducting wafers, Imaging systems, Photoresist processing

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Proceedings Article | 16 July 2002 Paper

Ultrafast wafer alignment simulation based on thin film theory

Qiang Wu, Gary Williams, Byeong Kim, Jay Strane, Timothy Wiltshire, Eric Lehner, Hiroyuki Akatsu

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473475

KEYWORDS: Optical alignment, Imaging systems, Signal processing, Photomasks, Thin films, Semiconducting wafers, Diffraction, Image segmentation, Lithography, Light scattering

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Proceedings Article | 2 June 2000 Paper

Subwavelength alignment mark signal analysis of advanced memory products

Xiaoming Yin, Alfred Wong, Donald Wheeler, Gary Williams, Eric Lehner, Franz Zach, Byeong Kim, Yuzo Fukuzaki, Zhijian Lu, Santo Credendino, Timothy Wiltshire

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386501

KEYWORDS: Optical alignment, Silicon, Silicon films, Polarization, Signal processing, Sensors, Signal analysis, Semiconducting wafers, Microelectronics, Semiconductors

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Proceedings Article | 29 June 1998 Paper

Characterization of a next-generation step-and-scan system

Timothy Wiltshire, Joseph Kirk, Donald Wheeler, Christopher Obszarny, James Marsh, Donald Odiwo

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310773

KEYWORDS: Overlay metrology, Metals, Optical alignment, Semiconducting wafers, Image processing, Semiconductors, Deep ultraviolet, Metrology, Reticles, Semiconductor manufacturing

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Proceedings Article | 29 June 1998 Paper

Alignment performance versus mark quality

Joseph Kirk, Jung Yoon, Timothy Wiltshire

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310777

KEYWORDS: Optical alignment, Photoresist materials, Overlay metrology, Semiconducting wafers, Lithography, Absorption, Control systems, Calibration, Semiconductor manufacturing, Quartz

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Proceedings Article | 17 May 1994 Paper

Progression of overlay performance on a 0.5-NA broadband DUV wafer exposure system

Joseph Vigil, Gerald Elder, David Cronin, Stan Drazkiewicz, Timothy Wiltshire

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175489

KEYWORDS: Optical alignment, Semiconducting wafers, Metals, Overlay metrology, Data transmission, Oxides, Reticles, Deep ultraviolet, Manufacturing, Lithography

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Proceedings Article | 8 August 1993 Paper

Performance of a 0.5 NA broadband DUV step-and-scan system

Mark Barrick, Doug Bommarito, Karey Holland, Katherine Norris, Bob Patterson, Yumiko Takamori, Joseph Vigil, Timothy Wiltshire

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150455

KEYWORDS: Semiconducting wafers, Overlay metrology, Deep ultraviolet, Optical alignment, Image processing, Manufacturing, Optical lithography, Distortion, Reliability, Wafer-level optics

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Showing 5 of 17 publications

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