Timothy J. Wiltshire
Member/Senior Technical Staff at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (17)

SPIE Journal Paper | May 2, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Overlay metrology, Distortion, Scanners, Reticles, Image processing, Semiconducting wafers, Error analysis, Optical alignment, Photomasks, Calibration

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Reticles, Optical lithography, Lithographic illumination, Scanners, Error analysis, Distortion, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Semiconductors, Lithography, Metrology, Etching, Scanning electron microscopy, Scatterometry, Photomasks, Critical dimension metrology, Semiconducting wafers, Scatter measurement

PROCEEDINGS ARTICLE | April 4, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Data modeling, Scanners, Manufacturing, Control systems, Process control, Semiconductor manufacturing, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Wafer-level optics, Semiconductors, Lithography, Logic, Metals, Manufacturing, Semiconducting wafers, Optical calibration, Optics manufacturing, Data corrections

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Reticles, Scanners, Manufacturing, Laser scanners, Software development, 3D scanning, Semiconducting wafers, Optics manufacturing, Overlay metrology

Showing 5 of 17 publications
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