Timothy Wu
at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Diffusion, Image resolution, Electroluminescence, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Nanoimprint lithography, Modulation transfer functions, Performance modeling

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Optical lithography, Imaging systems, Scanners, Electroluminescence, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Phase shifts

Proceedings Article | 7 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Etching, Manufacturing, Inspection, Chromium, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Deposition processes, Defect inspection

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Oxides, Optical lithography, Etching, Scanners, Electroluminescence, Photomasks, Critical dimension metrology, Semiconducting wafers, Photoresist developing, Tin

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Diffraction, Data modeling, Polarization, Signal attenuation, Pellicles, Projection systems, Photomasks, Immersion lithography, Optical proximity correction, Critical dimension metrology

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Wafer-level optics, Infrared sensors, Metrology, Sensors, Calibration, Scanners, Error analysis, Integrated optics, Critical dimension metrology, Semiconducting wafers

Showing 5 of 7 publications
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