Tito Dutta Chowdhury
Principal Engineer at
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | April 29, 2004
Proc. SPIE. 5378, Data Analysis and Modeling for Process Control
KEYWORDS: Semiconductors, Data modeling, Calibration, Etching, Process control, Photomasks, Semiconducting wafers, Performance modeling, Process modeling, Instrument modeling

PROCEEDINGS ARTICLE | June 12, 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Etching, Polymers, Chemistry, Photomasks, Plasma etching, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Plasma

PROCEEDINGS ARTICLE | June 2, 2003
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Semiconductors, Lithography, Etching, Metals, Chromium, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers, Process modeling

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