Tjarko van Empel
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 10 October 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Pellicles, Extreme ultraviolet, Scanners, Reticles, Inspection, Extreme ultraviolet lithography, Manufacturing, Deep ultraviolet, Statistical modeling, Statistical analysis

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Particles, Reticles, Scanners, Pellicles, Plasma, Extreme ultraviolet, Particle contamination

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