Tod Evan Robinson
Research & Development Engineer at RAVE LLC
SPIE Involvement:
Author
Publications (33)

Proceedings Article | 27 June 2019
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Multilayers, Metrology, Contamination, Deep ultraviolet, Quartz, Laser energy, Particles, Laser processing, Atomic force microscopy, Femtosecond lasers, Photomasks, Extreme ultraviolet, Particle contamination, Mask cleaning

Proceedings Article | 3 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Deep ultraviolet, Quartz, Particles, Laser processing, Laser development, Atomic force microscopy, Photomasks, Extreme ultraviolet, Pulsed laser operation

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Femtosecond phenomena, Deep ultraviolet, Opacity, Particles, Laser processing, Laser applications, Chromium, Pellicles, Photomasks

Proceedings Article | 8 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Multilayers, Image processing, Inspection, Scanning electron microscopy, Printing, Photomasks, Extreme ultraviolet, Mask making, Semiconducting wafers

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Calibration, Manufacturing, Inspection, Atomic force microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Phase shifts

Showing 5 of 33 publications
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