Dr. Todd Bailey
Pathfinding OPC Manager at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (27)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Calibration, Metals, Photoresist materials, Monte Carlo methods, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Stochastic processes, Edge roughness, Absorption

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Image quality, Photomasks, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, SRAF

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Fluctuations and noise, Polymers, Annealing, Molecules, Thermal effects, Directed self assembly, Integrated circuits, Applied physics, Molecular self-assembly

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Calibration, Photoresist materials, Monte Carlo methods, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, Stochastic processes, Edge roughness, EUV optics, Chemically amplified resists

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Diffractive optical elements, Diffusion, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Optimization (mathematics), Photoresist processing, Tolerancing, Stochastic processes, Edge roughness

SPIE Journal Paper | February 7, 2017
JM3 Vol. 16 Issue 01
KEYWORDS: Directed self assembly, Resolution enhancement technologies, Lithography, Metals, Optical lithography, Fin field effect transitor, Photomasks, 3D modeling, Computational lithography, Optical proximity correction

Showing 5 of 27 publications
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