Dr. Todd Bailey
Pathfinding OPC Manager at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (30)

Proceedings Article | 26 September 2019
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Modeling, Lithography, Optical lithography, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing, Model-based design, Process modeling, 193nm lithography

Proceedings Article | 22 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Image processing, Manufacturing, Printing, Image quality, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Vestigial sideband modulation

SPIE Journal Paper | 31 July 2018
JM3 Vol. 18 Issue 01
KEYWORDS: SRAF, Photomasks, Metals, Extreme ultraviolet lithography, Personal protective equipment, Photovoltaics, Extreme ultraviolet, Image quality, Source mask optimization, Lithography

Proceedings Article | 19 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Image quality, Photomasks, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, SRAF

Proceedings Article | 19 March 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Calibration, Metals, Photoresist materials, Monte Carlo methods, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Stochastic processes, Edge roughness, Absorption

Showing 5 of 30 publications
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