Dr. Todd Bailey
Pathfinding OPC Manager at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (29)

PROCEEDINGS ARTICLE | October 12, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Image processing, Manufacturing, Inspection, Image quality, Photomasks, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, SRAF

SPIE Journal Paper | July 31, 2018
JM3 Vol. 18 Issue 01
KEYWORDS: SRAF, Photomasks, Metals, Extreme ultraviolet lithography, Personal protective equipment, Photovoltaics, Extreme ultraviolet, Image quality, Source mask optimization, Lithography

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Calibration, Metals, Photoresist materials, Monte Carlo methods, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Stochastic processes, Edge roughness, Absorption

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Image quality, Photomasks, Extreme ultraviolet lithography, Source mask optimization, Optical proximity correction, SRAF

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Fluctuations and noise, Polymers, Annealing, Molecules, Thermal effects, Directed self assembly, Integrated circuits, Applied physics, Molecular self-assembly

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Calibration, Photoresist materials, Monte Carlo methods, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Photoresist processing, Stochastic processes, Edge roughness, EUV optics, Chemically amplified resists

Showing 5 of 29 publications
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