Dr. Tohru Satake
General Manager at ULVAC Technologies Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Electron beams, Defect detection, Inspection, Distortion, Scanning electron microscopy, Electron microscopy, Spatial resolution, Neodymium, Semiconducting wafers, Signal detection

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Wafer-level optics, Electron beams, Imaging systems, Inspection, Optical inspection, Electron microscopy, Spatial resolution, Semiconducting wafers, Signal detection, Yield improvement

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Wafer-level optics, Defect detection, Image processing, Inspection, Scanning electron microscopy, Electron microscopy, Projection systems, Semiconducting wafers, Signal detection, Prototyping

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