Mr. Tokihisa Kaneguchi
at Sony Semiconductor Solutions
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Polarization, Birefringence, Wave plates, Electroluminescence, Photomasks, Cadmium sulfide, Critical dimension metrology, Tolerancing, Lawrencium

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Logic, Lithographic illumination, Polarization, Manufacturing, Imaging devices, Photomasks, Optical proximity correction, SRAF, Line edge roughness

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Semiconductors, Lithography, Etching, Scatterometry, Process control, Photomasks, Optical proximity correction, Critical dimension metrology, Chemical elements, Photoresist processing

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