Grinding, polishing and finishing with ultra-precise form correction from one supplier. Satisloh provides machines, peripheral equipment, training, service, consumables, tools and process-support. All the equipment is made for industrial environment. Together with exclusive, experienced partners, aspheres will be manufactured more efficient.
SP-100 from Satisloh is the perfect coating machine for application in precision optics. Thanks to its innovative concept SP-100 can coat materials in a range of refraction indexes from 1.47 up to 2.05 in the visible (with all the intermediate indexes in between) and up to n=3.5 in the infrared by using only one target material. SP-100 is well suitable for application in the field of microscopy, laser optics, watches, optical filters, endoscopy, semiconductors and more. By replacing the target material the application range of the machine can be further extended. SP-100 is based on the reliable reactive bipolar Direct Current (DC) pulsed magnetron sputtering technology which guarantees high density of the deposited species, low stress of the deposited multilayer film, high reproducibility, very high hardness (up to 1200 Vickers hardness) with unbeatable high rates ideal for industrial applications. DC-pulsed sputtering assure less arc events and a lower heat load than Radio Frequency (RF) sputtering making SP-100 suitable for different substrates material and for cemented lenses. The small chamber of the SP-100 ensures very fast processes and a broadband AR can be coated in less than 15 minutes process time door to door. Thanks to its flexible substrate holder SP-100 can hold lenses of different sizes and shapes: from small size optics up to 100 mm diameter lenses, rod lenses up to 50 mm length or even glass fibers.
Pulsed DC reactive sputtering is a very interesting technique for coating applications. Reactive sputtering can give very dense layers, low stress of the deposited multilayer film, high reproducibility, very high hardness (up to 1200 Vickers hardness) with unbeatable high rates ideal for industrial applications. SP-100 is Satisloh reactive sputtering systems with only one target material but can deposit various film materials simply by using different gases such as argon, as well as the reactive gases nitrogen and oxygen. Silicon-oxides, silicon-nitrides and all kinds of silicon-oxy-nitrides (SiO<sub>x</sub>-Si<sub>x</sub>O<sub>y</sub>N<sub>z</sub>-Si<sub>x</sub>N<sub>y</sub>) with a refractive index range of 1.44-2.05 in the visible range can be obtained. In the reactive sputtering the material it is usually deposited in the so called “transition mode” where it must be found the correct equilibrium point between the target voltage and the reactive gas flow. The transition mode assures a dense film with a stable rate. Condition to find such equilibrium point is given by the so called “material hysteresis” in which the target voltage is depicted in function of the reactive gas voltage. The hysteresis and the consequent equilibrium point are strongly depended by the power supplied to the target and the inert gas (argon) flow which could affect the optical characteristics and the deposition rate. We checked the refractive indexes of the SiO<sub>x</sub> and Si<sub>x</sub>N<sub>y</sub> of very thin (1 QW Optical thickness at 520 nm) and thicker (3, 5 and 9 QW @520 nm) reporting how the different conditions can affect the refractive index and the deposition rate of the different materials.
Conference Committee Involvement (9)
14 October 2019 | Rochester, New York, United States
16 October 2017 | Rochester, New York, United States
12 October 2015 | Rochester, New York, United States
14 October 2013 | Rochester, New York, United States