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Tomas Chin
at Nanya Technology Corp
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Publications (3)
Proceedings Article | 17 October 2008 Paper
70nm DRAM intra-field CDU improvement by dose modulation on mask transmittance
Tomas Chin, Wen Bin Wu, Chiang Lin Shih, Pei Cheng Fan, Guy Ben Zvi
Proceedings Volume 7122, 712238 (2008) https://doi.org/10.1117/12.801417
KEYWORDS: Photomasks, Critical dimension metrology, Transmittance, Modulation, Calibration, Semiconducting wafers, Reticles, Signal attenuation, Scanners, Quartz
Proceedings Article | 17 October 2008 Paper
High accuracy jog CD control on OPC pattern by advanced laser writer Sigma7500
Tomas Chin, Wen-Bin Wu, Chiang-Lin Shih
Proceedings Volume 7122, 712237 (2008) https://doi.org/10.1117/12.801414
KEYWORDS: Critical dimension metrology, Optical proximity correction, Photomasks, Electron beams, Spatial light modulators, Vestigial sideband modulation, Laser applications, Deep ultraviolet, Modulation, Beam shaping
Proceedings Article | 30 October 2007 Paper
Evaluation of the effect of mask-blank flatness on CDU and DOF in high-NA systems
Christopher Lee, Chia Wen Chang, Tomas Chin, Richard Lu, Steven Fan, Derek Chen, Gordon Chan, Torey Huang
Proceedings Volume 6730, 67300D (2007) https://doi.org/10.1117/12.746614
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Finite element methods, Critical dimension metrology, Error analysis, Lutetium, Fluctuations and noise, Printing, Pellicles
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