Tomas Chin
at Nanya Technology Corp
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Electron beams, Deep ultraviolet, Modulation, Laser applications, Spatial light modulators, Photomasks, Beam shaping, Optical proximity correction, Critical dimension metrology, Vestigial sideband modulation

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Reticles, Modulation, Signal attenuation, Calibration, Quartz, Scanners, Transmittance, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 30 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Fluctuations and noise, Error analysis, Pellicles, Printing, Finite element methods, Photomasks, Lutetium, Critical dimension metrology, Semiconducting wafers

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top